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Wonderful Life with

KOLON PRODUCTS

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Dry Film Resist

Overview

KOLON Industries, Inc. is competing with leading international companies, such as U.S. Dupont, Japan’s Hitachi and Asahi, and now has over 60% market share in the dry film photoresist industry. The company was also the first company to develop dry films and localize them in the market where foreign products were dominant. Its technology became further recognized through the development of ultra-high resolution films, which require the most advanced technology in the industry. The dry film photoresist market is growing with the expansion of the electronicsmarket, including semiconductors and LCDs, and KOLON Industries, Inc.’s Accuimage® is a photosensitive film with a resist thickness ranging from 5 to 150um and is used for multiple purposes, such as PCB, L/F, packaging, and PDP. The product has met customers’ needs with excellent properties and is increasing market share with outstanding quality and competitive prices compared with existing foreign products.

Electronic Materials  Website GO

Features and Uses

Tenting & Etching Grade
Excellent circuit properties, extensive workability, remarkable tenting properties; comes in two types for external-layer tening process and inner-layer etching process.
Plating Grade
Excellent circuit properties, extensive workability, remakrable coating tolerance; used for external-layer plating process.
Packging Grade
Provides ultra-high resolution; used for IC packaging, such as BGA and L/F.
PDP Grade
Used for sandblasting and ITO etching; the sandblasting type provides resistance to sandblasting and the ITO etching type resistance to nitric acid.
Special Grade
The LDI type provides ultra high sensitivity and is used for laser source 355nm and 405nm and the thick film (thickness from 100~150um) is used for bump formation.

History, Awards and Certificates

1984
Began research and development at the Gumi Technology Research Center
1988
Completed research and began plant construction
1990
Completed the plant (Unit 1)
1993 ~ 1997
Increased the capacity
1999
Obtained ISO9002 certificate, won the IR52 Chang Young Shil award
2001
Completed DFR-2 Project
2004
Installed American slitters
2005
Completed DFR-3 Project
2010
Won the IR52 Chang Young Shil award
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